Invention Grant
- Patent Title: Light emitting diode with wave-shaped Bragg reflective layer and method for manufacturing same
- Patent Title (中): 具有波形布拉格反射层的发光二极管及其制造方法
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Application No.: US14083361Application Date: 2013-11-18
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Publication No.: US09000445B2Publication Date: 2015-04-07
- Inventor: Ching-Hsueh Chiu , Ya-Wen Lin , Po-Min Tu , Shih-Cheng Huang
- Applicant: Advanced Optoelectronic Technology, Inc.
- Applicant Address: TW Hsinchu Hsien
- Assignee: Advanced Optoelectronic Technology, Inc.
- Current Assignee: Advanced Optoelectronic Technology, Inc.
- Current Assignee Address: TW Hsinchu Hsien
- Agency: Novak Druce Connolly Bove + Quigg LLP
- Priority: CN2013101015391 20130327
- Main IPC: H01L33/46
- IPC: H01L33/46 ; H01L33/32 ; H01L33/00 ; H01L33/10

Abstract:
An exemplary light emitting diode includes a substrate and a first undoped GaN layer formed on the substrate. The first undoped GaN layer has ion implanted areas on an upper surface thereof. A plurality of second undoped GaN layers is formed on the first undoped GaN layer. Each of the second undoped GaN layers is island shaped and partly covers at least one corresponding ion implanted area. A Bragg reflective layer is formed on the second undoped GaN layer and on portions of upper surfaces of the ion implanted areas not covered by the second undoped GaN layers. An n-type GaN layer, an active layer and a p-type GaN layer are formed on an upper surface of the Bragg reflective layer in that sequence. A method for manufacturing the light emitting diode is also provided.
Public/Granted literature
- US20140291689A1 LIGHT EMITTING DIODE WITH WAVE-SHAPED BRAGG REFLECTIVE LAYER AND METHOD FOR MANUFACTURING SAME Public/Granted day:2014-10-02
Information query
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