Invention Grant
- Patent Title: Semiconductor device with equipotential ring contact at curved portion of equipotential ring electrode and method of manufacturing the same
- Patent Title (中): 在等电位环电极的弯曲部分具有等电位环接触的半导体器件及其制造方法
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Application No.: US13164866Application Date: 2011-06-21
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Publication No.: US09000538B2Publication Date: 2015-04-07
- Inventor: Kouichi Murakawa
- Applicant: Kouichi Murakawa
- Applicant Address: JP Kanagawa
- Assignee: Renesas Electronics Corporation
- Current Assignee: Renesas Electronics Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-149510 20100630
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/78 ; H01L29/40 ; H01L29/06 ; H01L29/417 ; H01L29/45

Abstract:
A downsized semiconductor device having an excellent reverse characteristic, and a method of manufacturing the semiconductor device is sought to improve. The semiconductor device comprises a semiconductor body having a polygonal contour. An active area is formed in the semiconductor body. An EQR electrode is formed so as to surround the active area and to have curved portions of the EQR electrode along the corners of the semiconductor body. An interlayer insulating film is formed to cover the active area and the EQR electrode. The EQR electrode is embedded in the interlayer insulating film around the active area. EQR contacts are in contact with the curved portions of the EQR electrode and the semiconductor body outside the curved portions, and have at least side walls covered with the interlayer insulating film.
Public/Granted literature
- US20120001257A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2012-01-05
Information query
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