Invention Grant
US09000561B2 Patterned ground shield structures and semiconductor devices 有权
图案化的接地屏蔽结构和半导体器件

Patterned ground shield structures and semiconductor devices
Abstract:
A patterned ground shield structure is provided. The patterned ground shield structure includes a substrate having a dielectric layer. The patterned ground shield structure also includes a plurality of conductive rings having a plurality of sub conductive rings in the dielectric layer. Further, the patterned ground shield structure includes an interconnection line connecting with all of the sub conductive rings in the dielectric layer. Further, the patterned ground shield structure also includes a ground ring connecting with the interconnection line.
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