Invention Grant
US09001306B2 Exposure apparatus, exposure method, and method of manufacturing device
有权
曝光装置,曝光方法和制造装置的方法
- Patent Title: Exposure apparatus, exposure method, and method of manufacturing device
- Patent Title (中): 曝光装置,曝光方法和制造装置的方法
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Application No.: US14094950Application Date: 2013-12-03
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Publication No.: US09001306B2Publication Date: 2015-04-07
- Inventor: Takanori Sato
- Applicant: Canon Kabushiki Kaisha
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2010-107716 20100507
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52 ; G03F7/20 ; G03B27/53 ; G03B27/58 ; G03F9/00

Abstract:
A scanning exposure apparatus measures levels of a substrate at a predetermined position on the substrate during an acceleration period and during a constant velocity period, obtains a correction value for a measurement error due to factors associated with acceleration based on the difference between the measurement results at the predetermined position, corrects the level of the substrate measured at a first measurement point using the obtained correction value when the substrate is exposed at a given position after the level of the substrate at the given position is measured at the first measurement point during the acceleration period.
Public/Granted literature
- US20140092374A1 EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD OF MANUFACTURING DEVICE Public/Granted day:2014-04-03
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