Invention Grant
US09001306B2 Exposure apparatus, exposure method, and method of manufacturing device 有权
曝光装置,曝光方法和制造装置的方法

Exposure apparatus, exposure method, and method of manufacturing device
Abstract:
A scanning exposure apparatus measures levels of a substrate at a predetermined position on the substrate during an acceleration period and during a constant velocity period, obtains a correction value for a measurement error due to factors associated with acceleration based on the difference between the measurement results at the predetermined position, corrects the level of the substrate measured at a first measurement point using the obtained correction value when the substrate is exposed at a given position after the level of the substrate at the given position is measured at the first measurement point during the acceleration period.
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