Invention Grant
US09001605B2 Method of overlapping interconnect signal lines for reducing capacitive coupling effects 有权
用于减少电容耦合效应的互连信号线重叠方法

Method of overlapping interconnect signal lines for reducing capacitive coupling effects
Abstract:
Described herein are various principles for designing, manufacturing, and operating integrated circuits having functional components and one or more metal interconnect layers, where the dimensions of signal lines of the metal interconnect layers are larger than dimensions of the functional components. In some embodiments, a signal line may have a width greater than a width of a terminal of a functional component to which the signal line is connected. In some embodiments, two functional components formed in a same functional layer of the integrated circuit may be connected to metal signal lines in different metal interconnect layers. Further, the metal signal lines of the different metal interconnect layers may overlap some distance.
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