Invention Grant
US09001859B2 Ridge semiconductor laser and method for manufacturing a ridge semiconductor laser
有权
脊半导体激光器和脊半导体激光器的制造方法
- Patent Title: Ridge semiconductor laser and method for manufacturing a ridge semiconductor laser
- Patent Title (中): 脊半导体激光器和脊半导体激光器的制造方法
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Application No.: US13577858Application Date: 2011-01-27
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Publication No.: US09001859B2Publication Date: 2015-04-07
- Inventor: Atsuo Kozen , Yasuyoshi Ote , Jun-ichi Asaoka , Kenji Hirai , Hiroshi Yokoyama
- Applicant: Atsuo Kozen , Yasuyoshi Ote , Jun-ichi Asaoka , Kenji Hirai , Hiroshi Yokoyama
- Applicant Address: JP Kanagawa
- Assignee: NTT Electronics Corporation
- Current Assignee: NTT Electronics Corporation
- Current Assignee Address: JP Kanagawa
- Agency: Ohlandt Greeley Ruggiero & Perle L.L.P.
- Priority: JP2010-041889 20100226
- International Application: PCT/JP2011/051658 WO 20110127
- International Announcement: WO2011/105162 WO 20110901
- Main IPC: H01S5/00
- IPC: H01S5/00 ; H01S5/12 ; H01S5/22 ; H01S5/20

Abstract:
The ridge semiconductor laser is a semiconductor laser in which a carrier stopper layer made of an AlInAs compound, a clad layer made of an AlGaInAs compound, and an etching stopper layer made of an InGaAsP compound are stacked in sequence on one side of an active layer made of an AlGaInAs compound. The ridge semiconductor laser is provided with a ridge waveguide including, in a layer made of an InP compound, a diffraction grating made of an InGaAsP compound on the opposite side of the clad layer of the etching stopper layer.
Public/Granted literature
- US20120314727A1 RIDGE SEMICONDUCTOR LASER AND METHOD FOR MANUFACTURING A RIDGE SEMICONDUCTOR LASER Public/Granted day:2012-12-13
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