Invention Grant
- Patent Title: System and method of semiconductor characterization
- Patent Title (中): 半导体表征的系统和方法
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Application No.: US14336046Application Date: 2014-07-21
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Publication No.: US09002677B1Publication Date: 2015-04-07
- Inventor: Ramesh Rajaduray
- Applicant: Raja Technologies
- Applicant Address: CA North York, Ontario
- Assignee: Raja Technologies
- Current Assignee: Raja Technologies
- Current Assignee Address: CA North York, Ontario
- Agency: Nixon Peabody LLP
- Main IPC: G06F17/18
- IPC: G06F17/18 ; G01R31/265

Abstract:
A method for characterizing a semiconductor sample, said method comprising: shining light on one or more points in said semiconductor sample; measuring one or more voltage decay curves corresponding to said shining of light on said one or more points in said semiconductor sample; extracting one or more intermediate voltage decay curves corresponding to one or more measured voltage decay curves; obtaining one or more normalized decay curves corresponding to one or more intermediate voltage decay curves, each of the said one or more normalized decay curves corresponding to one or more discrete estimates of survival functions; and analyzing said obtained one or more normalized decay curves, said analyzing comprising obtaining one or more discrete estimates of the probability of recombination corresponding to the one or more normalized decay curves, and computing one or more summary statistics corresponding to each of said obtained one or more discrete estimates.
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