Invention Grant
- Patent Title: Flow control device
- Patent Title (中): 流量控制装置
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Application No.: US13747869Application Date: 2013-01-23
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Publication No.: US09010719B2Publication Date: 2015-04-21
- Inventor: Kazuki Hirai , Hiroki Igarashi
- Applicant: Surpass Industry Co., Ltd.
- Applicant Address: JP Gyoda-Shi, Saitama
- Assignee: Surpass Industry Co., Ltd.
- Current Assignee: Surpass Industry Co., Ltd.
- Current Assignee Address: JP Gyoda-Shi, Saitama
- Agency: Thomas, Karceski & Karmilovich, PC
- Priority: JP2012-014273 20120126
- Main IPC: F16K31/00
- IPC: F16K31/00 ; F16K31/126

Abstract:
A flow control device is capable of performing accurate flow control over a wide pressure range. The flow control device includes: a housing; a diaphragm splitting the housing into a gas chamber side to which gas is introduced and a fluid chamber side through which fluid passes, and being activated by the differential pressure generated between the gas chamber side and the fluid chamber side; and a valve body which operates in integration with the diaphragm to regulate the flow of the fluid introduced to the fluid chamber side. The diaphragm includes: a base part provided in a substantially central part of the diaphragm; and a thin film part provided on the outer rim of the base part. An opposing surface which is provided on the fluid chamber side to oppose the diaphragm includes a retaining form which retains the shape of the thin film part deformed by the differential pressure.
Public/Granted literature
- US20130207010A1 Flow control device Public/Granted day:2013-08-15
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