Invention Grant
- Patent Title: Material deposition system and method for depositing materials on a substrate
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Application No.: US14537007Application Date: 2014-11-10
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Publication No.: US09010910B2Publication Date: 2015-04-21
- Inventor: Kenneth C. Crouch , Kui-Chiu Kwok , Robert W. Tracy , Rita Mohanty , Thomas J. Karlinski , Scott A. Reid
- Applicant: Illinois Tool Works Inc.
- Applicant Address: US IL Glenview
- Assignee: Illinois Tool Works Inc.
- Current Assignee: Illinois Tool Works Inc.
- Current Assignee Address: US IL Glenview
- Agency: Lando & Anastasi, LLP
- Main IPC: B41J2/07
- IPC: B41J2/07 ; B41J2/04 ; B41J2/02 ; H05K3/00

Abstract:
A material deposition system includes a frame, a support coupled to the frame to support an electronic substrate during a deposit operation, a gantry coupled to the frame, and a deposition head coupled to the gantry. The deposition head is movable over the support by movement of the gantry. The deposition head includes a chamber to hold material, an actuator to push a volume of material out of the chamber, a needle extending from the chamber and terminating in a needle orifice, and at least two air jets located on opposite sides of the needle orifice. A desired volume of material is formed at the needle orifice in response to the actuator, and each of the at least two air jets produce a timed pulse of air to create a micro-droplet from the desired volume and to accelerate the micro-droplet to high velocity.
Public/Granted literature
- US20150064345A1 MATERIAL DEPOSITION SYSTEM AND METHOD FOR DEPOSITING MATERIALS ON A SUBSTRATE Public/Granted day:2015-03-05
Information query
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