Invention Grant
US09011633B2 Broadband techniques to reduce the effects of impedance mismatch in plasma chambers
有权
宽带技术来减少等离子体室中阻抗失配的影响
- Patent Title: Broadband techniques to reduce the effects of impedance mismatch in plasma chambers
- Patent Title (中): 宽带技术来减少等离子体室中阻抗失配的影响
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Application No.: US11164303Application Date: 2005-11-17
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Publication No.: US09011633B2Publication Date: 2015-04-21
- Inventor: Scott R. Bullock , Aaron Radomski , Brent Irvine
- Applicant: Scott R. Bullock , Aaron Radomski , Brent Irvine
- Applicant Address: US MA Andover
- Assignee: MKS Instruments, Inc.
- Current Assignee: MKS Instruments, Inc.
- Current Assignee Address: US MA Andover
- Agency: Harness, Dickey & Pierce, P.L.C.
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23F1/00 ; H01J7/24 ; H05B31/26 ; H01J37/32
Abstract:
A plasma generator system for reducing the effects of impedance mismatch. The system has a variable frequency source having an output for emitting an RF signal. A plasma chamber has an input for receiving the RF signal. The variable frequency source modulates at least one of the frequency and phase of the RF signal to improve the system tolerance of impedance mismatches between the output of the variable frequency source and the input of the plasma chamber.
Public/Granted literature
- US20070107844A1 Broadband Techniques to Reduce the Effects of Impedance Mismatch in Plasma Chambers Public/Granted day:2007-05-17
Information query
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