Invention Grant
- Patent Title: After-treatment system
- Patent Title (中): 后处理系统
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Application No.: US13571053Application Date: 2012-08-09
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Publication No.: US09011782B2Publication Date: 2015-04-21
- Inventor: Mirza P. Baig , Thomas W. Manning , Rick E. Jeffs , Kristian N. Engelsen , Andrew M. Denis , Pradyumna V. Rao
- Applicant: Mirza P. Baig , Thomas W. Manning , Rick E. Jeffs , Kristian N. Engelsen , Andrew M. Denis , Pradyumna V. Rao
- Applicant Address: US IL Peoria
- Assignee: Caterpillar Inc.
- Current Assignee: Caterpillar Inc.
- Current Assignee Address: US IL Peoria
- Agency: Leydig, Voit & Mayer, Ltd.
- Main IPC: B01D50/00
- IPC: B01D50/00 ; F01N3/20 ; F01N3/28 ; F01N13/18 ; F01N3/035 ; F01N3/10 ; F01N13/00

Abstract:
An after-treatment system includes a Selective Catalytic Reduction (SCR) catalyst or a similar aftertreatment unit or brick that may be inserted into the opened end of a sleeve. The aftertreatment brick includes a substrate matrix with catalytic material that extends between a first face and a second face. A mantle is disposed around the substrate matrix and extends between a first rim proximate the first face and a second rim proximate the second face. The mantel may include a overhang extension that extends the first rim of the mantle beyond the first face of the substrate matrix. To enable retrieval of the SCR catalyst from the sleeve, a retrieval feature is disposed on a readily accessible, inner surface of the overhang extension.
Public/Granted literature
- US20140044612A1 After-Treatment System Public/Granted day:2014-02-13
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