Invention Grant
- Patent Title: Systems for producing silane
- Patent Title (中): 生产硅烷的系统
-
Application No.: US13715642Application Date: 2012-12-14
-
Publication No.: US09011803B2Publication Date: 2015-04-21
- Inventor: Puneet Gupta , Henry F. Erk , Alexis Grabbe
- Applicant: MEMC Electronic Materials, Inc.
- Applicant Address: US MO Maryland Heights
- Assignee: SunEdison, Inc.
- Current Assignee: SunEdison, Inc.
- Current Assignee Address: US MO Maryland Heights
- Agency: Armstrong Teasdale LLP
- Main IPC: C01B33/00
- IPC: C01B33/00 ; C01B33/02 ; C01B33/027 ; C01B33/029 ; C01B33/04 ; C01B33/08 ; C01B33/107 ; C25B1/00 ; C25B3/00 ; C25B3/02 ; C25B3/06 ; C25B3/08

Abstract:
Methods and systems for producing silane that use electrolysis to regenerate reactive components therein are disclosed. The methods and systems may be substantially closed-loop with respect to halogen, an alkali or alkaline earth metal and/or hydrogen.
Public/Granted literature
- US20130121888A1 SYSTEMS FOR PRODUCING SILANE Public/Granted day:2013-05-16
Information query