Invention Grant
- Patent Title: Method of producing silicon carbide
- Patent Title (中): 生产碳化硅的方法
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Application No.: US12340084Application Date: 2008-12-19
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Publication No.: US09011811B2Publication Date: 2015-04-21
- Inventor: Hidehiko Tanaka , Yoshitaka Aoki
- Applicant: Hidehiko Tanaka , Yoshitaka Aoki
- Applicant Address: JP Tsukuba-shi JP Tokyo
- Assignee: National Institute for Materials Science,Shin-Etsu Chemical Co., Ltd.
- Current Assignee: National Institute for Materials Science,Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tsukuba-shi JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2007-338066 20071227
- Main IPC: C01B31/36
- IPC: C01B31/36 ; C04B35/565 ; C04B35/571 ; C04B35/626 ; C04B35/632

Abstract:
A method of producing silicon carbide is provided. The method includes heating a cured product of a curable silicone composition in a non-oxidizing atmosphere at a temperature exceeding 1,500° C. but not more than 2,600° C. The method is capable of producing high-purity silicon carbide simply and at a high degree of productivity, and is capable of simply producing a silicon carbide molded item having a desired shape and dimensions.
Public/Granted literature
- US20090169458A1 METHOD OF PRODUCING SILICON CARBIDE Public/Granted day:2009-07-02
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