Invention Grant
- Patent Title: Cell layout for SRAM FinFET transistors
- Patent Title (中): SRAM FinFET晶体管的单元布局
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Application No.: US13788954Application Date: 2013-03-07
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Publication No.: US09012287B2Publication Date: 2015-04-21
- Inventor: Jhon Jhy Liaw
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/336
- IPC: H01L21/336 ; H01L27/11 ; H01L27/02 ; H01L21/8238 ; H01L21/84 ; H01L29/66 ; H01L27/092 ; H01L27/12 ; H01L21/8234

Abstract:
An SRAM array and method of making is disclosed. Each SRAM cell comprises two pull-up (PU), two pass-gate (PG), and two pull-down (PD) FinFETs. The PU transistors are adjacent to each other and include one active fin having a first fin width. Each PG transistor shares at least one active fin with a PD transistor. The at least one active fin shared by a PG and a PD transistor has a second fin width smaller than the first fin width. The method includes patterning a plurality of fins including active fins and dummy fins and patterning and removing at least a portion of the dummy fins. No dummy fin is disposed between PU FinFETs in a memory cell. One dummy fin is disposed between a PU FinFET and the at least one active fin shared by a PG and a PD transistor. At least one dummy fin is disposed between adjacent memory cells.
Public/Granted literature
- US20140131813A1 Cell Layout for SRAM FinFET Transistors Public/Granted day:2014-05-15
Information query
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