Invention Grant
US09012315B2 Methods and systems for dopant activation using microwave radiation
有权
使用微波辐射的掺杂剂激活的方法和系统
- Patent Title: Methods and systems for dopant activation using microwave radiation
- Patent Title (中): 使用微波辐射的掺杂剂激活的方法和系统
-
Application No.: US13963043Application Date: 2013-08-09
-
Publication No.: US09012315B2Publication Date: 2015-04-21
- Inventor: Chun Hsiung Tsai , Yan-Ting Lin , Cheng-Yan Zhan , Yi-Tang Lin , Clement Hsingjen Wann
- Applicant: Taiwan Semiconductor Manufacturing Company Limited
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee: Taiwan Semiconductor Manufacturing Company Limited
- Current Assignee Address: TW Hsinchu
- Agency: Jones Day
- Main IPC: H01L21/268
- IPC: H01L21/268 ; H01L29/36 ; H05B6/80

Abstract:
Systems and methods are provided for activating dopants in a semiconductor structure. For example, a semiconductor structure including a plurality of dopants is provided. One or more microwave-absorption materials are provided, the microwave-absorption materials being capable of increasing an electric field density associated with the semiconductor structure. Microwave radiation is applied to the microwave-absorption materials and the semiconductor structure to activate the plurality of dopants for fabricating semiconductor devices. The microwave-absorption materials are configured to increase the electric field density in response to the microwave radiation so as to increase the semiconductor structure's absorption of the microwave radiation to activate the dopants.
Public/Granted literature
- US20150041966A1 Methods and Systems for Dopant Activation Using Microwave Radiation Public/Granted day:2015-02-12
Information query
IPC分类: