Invention Grant
- Patent Title: Composition and method for preparing pattern on a substrate
- Patent Title (中): 在基材上制备图案的组合物和方法
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Application No.: US13601183Application Date: 2012-08-31
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Publication No.: US09012545B2Publication Date: 2015-04-21
- Inventor: Xinyu Gu , Shih-Wei Chang , Rahul Sharma , Valeriy Ginzburg , Phillip Hustad , Jeffrey Weinhold , Peter Trefonas
- Applicant: Xinyu Gu , Shih-Wei Chang , Rahul Sharma , Valeriy Ginzburg , Phillip Hustad , Jeffrey Weinhold , Peter Trefonas
- Applicant Address: US MA Marlborough US MI Midland
- Assignee: Rohm and Haas Electronic Materials LLC,Dow Global Technologies LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC,Dow Global Technologies LLC
- Current Assignee Address: US MA Marlborough US MI Midland
- Agent Thomas S. Deibert
- Main IPC: C08K5/01
- IPC: C08K5/01 ; C03C15/00 ; C08K5/357 ; C08K5/04 ; C09D153/00 ; G03F7/00
Abstract:
A copolymer composition and a method of processing a substrate to form line space features thereon are provided.
Public/Granted literature
- US20140061155A1 Composition and method for preparing pattern on a substrate Public/Granted day:2014-03-06
Information query
