Invention Grant
- Patent Title: Photo-patternable dielectric materials and formulations and methods of use
- Patent Title (中): 光刻图介质材料及配方及使用方法
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Application No.: US13861452Application Date: 2013-04-12
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Publication No.: US09012587B2Publication Date: 2015-04-21
- Inventor: Robert David Allen , Phillip Joe Brock , Blake W. Davis , Qinghuang Lin , Robert Dennis Miller , Alshakim Nelson , Ratnam Sooriyakumaran
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts
- Main IPC: C08G77/20
- IPC: C08G77/20 ; H01B3/30 ; C09D183/04 ; C09D183/14 ; H01L21/02 ; H01L21/312 ; H01L21/768
Abstract:
Silsesquioxane polymers, silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers, and structures made from silsesquioxane polymers.
Public/Granted literature
- US20130292163A1 PHOTO-PATTERNABLE DIELECTRIC MATERIALS AND FORMULATIONS AND METHODS OF USE Public/Granted day:2013-11-07
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