Invention Grant
- Patent Title: Light-emitting device having patterned interface and the manufacturing method thereof
- Patent Title (中): 具有图案化界面的发光器件及其制造方法
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Application No.: US13903169Application Date: 2013-05-28
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Publication No.: US09012942B2Publication Date: 2015-04-21
- Inventor: Jenn-Hwa Fu , Cheng-Hsien Li , Chi-Hao Huang
- Applicant: Epistar Corporation
- Applicant Address: TW Hsinchu
- Assignee: Epistar Corporation
- Current Assignee: Epistar Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Patterson & Sheridan, LLP
- Priority: TW101119052A 20120528
- Main IPC: H01L33/00
- IPC: H01L33/00 ; H01L33/22

Abstract:
The present disclosure provides a light-emitting device having a patterned interface composed of a plurality of predetermined patterned structures mutually distinct, wherein the plurality of predetermined patterned structures are repeatedly arranged in the patterned interface such that any two neighboring patterned structures are different from each other. The present disclosure also provides a manufacturing method of the light-emitting device. The method comprises the steps of providing a substrate, generating a random pattern arrangement by a computing simulation, forming a mask having the random pattern arrangement on the substrate, and removing a portion of the substrate thereby transferring the random pattern arrangement to the substrate.
Public/Granted literature
- US20130313596A1 LIGHT-EMITTING DEVICE HAVING PATTERNED INTERFACE AND THE MANUFACTURING METHOD THEREOF Public/Granted day:2013-11-28
Information query
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