Invention Grant
- Patent Title: Semiconductor packages including heat diffusion vias and interconnection vias
- Patent Title (中): 包括热扩散通孔和互连通孔的半导体封装
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Application No.: US14185394Application Date: 2014-02-20
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Publication No.: US09013031B2Publication Date: 2015-04-21
- Inventor: Yunhyeok Im , Jichul Kim , Kyol Park , Seongho Shin
- Applicant: Yunhyeok Im , Jichul Kim , Kyol Park , Seongho Shin
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec, P.A.
- Priority: KR10-2013-0069754 20130618
- Main IPC: H01L23/02
- IPC: H01L23/02 ; H01L23/36 ; H01L23/34 ; H01L23/48

Abstract:
A semiconductor package includes a lower package including a lower semiconductor chip on a lower package substrate, an upper package on the lower package, and a heat interface material between the lower package and the upper package. The upper package includes an upper semiconductor chip on an upper package substrate including a center portion adjacent to the lower semiconductor chip and an edge portion. The heat interface material is in contact with a top surface of the lower semiconductor chip and the upper package substrate. The upper package substrate includes a heat diffusion via penetrating the center portion and an interconnection via penetrating the edge portion. The interconnection via is spaced apart from the heat diffusion via.
Public/Granted literature
- US20140367860A1 SEMICONDUCTOR PACKAGES INCLUDING HEAT DIFFUSION VIAS AND INTERCONNECTION VIAS Public/Granted day:2014-12-18
Information query
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