Invention Grant
- Patent Title: Image processing device, measuring/testing system, and program
- Patent Title (中): 图像处理装置,测量/测试系统和程序
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Application No.: US13516565Application Date: 2010-12-17
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Publication No.: US09013571B2Publication Date: 2015-04-21
- Inventor: Yuichi Abe
- Applicant: Yuichi Abe
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2009-288140 20091218
- International Application: PCT/JP2010/072780 WO 20101217
- International Announcement: WO2011/074671 WO 20110623
- Main IPC: H04N9/47
- IPC: H04N9/47 ; H04N7/18 ; G01N23/00 ; G06K9/00 ; G06T7/00 ; H01L21/66

Abstract:
The present invention provides a contour extraction technique capable of resolving not only spuriousness, duplication, or branches in the contours of a sample pattern, but also discontinuities in the contours. A thinning process is performed with respect to design data for generating a sample pattern, and pattern in/out definition information defining the inside and outside of a pattern formed on a target sample is generated. Then, based on the Marker Controlled Watershed Segmentation method, region segmentation is performed by expanding regions indicated by the pattern in/out definition information while referencing pixel values of an edge-enhanced image of a target sample image, and pattern contours are generated.
Public/Granted literature
- US20120257039A1 Image Processing Device, Measuring/Testing System, and Program Public/Granted day:2012-10-11
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