Invention Grant
US09013912B2 Nonvolatile semiconductor memory device and method of forming same
有权
非易失性半导体存储器件及其形成方法
- Patent Title: Nonvolatile semiconductor memory device and method of forming same
- Patent Title (中): 非易失性半导体存储器件及其形成方法
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Application No.: US13845668Application Date: 2013-03-18
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Publication No.: US09013912B2Publication Date: 2015-04-21
- Inventor: Yasuhiro Nojiri , Shigeki Kobayashi , Masaki Yamato , Hiroyuki Fukumizu
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2013-45037 20130307
- Main IPC: G11C11/4193
- IPC: G11C11/4193 ; G11C13/00

Abstract:
A nonvolatile semiconductor memory device according to an embodiment comprises: a memory cell array including a plurality of memory layers; and a control unit configured to control a voltage applied to the memory cell array. Each of the memory layers comprises a first line and a second line, and further includes a memory cell disposed between the first line and the second line and including a variable resistance element. The control unit is configured to, when executing a forming operation on the memory cell array, execute the forming operation sequentially on the plurality of memory layers. The forming operation is executed sequentially on the memory layers in ascending order of a magnitude of a non-selected current flowing in a non-selected memory cell during the forming operation.
Public/Granted literature
- US20140063911A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD OF FORMING SAME Public/Granted day:2014-03-06
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