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US09015642B2 Hybrid method for performing full field optical proximity correction for finfet mandrel layer 有权
用于finfet心轴层的全场光学邻近校正的混合方法

  • Patent Title: Hybrid method for performing full field optical proximity correction for finfet mandrel layer
  • Patent Title (中): 用于finfet心轴层的全场光学邻近校正的混合方法
  • Application No.: US13803293
    Application Date: 2013-03-14
  • Publication No.: US09015642B2
    Publication Date: 2015-04-21
  • Inventor: Yi Zou
  • Applicant: Yi Zou
  • Applicant Address: KY Grand Cayman
  • Assignee: Globalfoundries Inc.
  • Current Assignee: Globalfoundries Inc.
  • Current Assignee Address: KY Grand Cayman
  • Agency: Ditthavong & Steiner, P.C.
  • Main IPC: G06F17/50
  • IPC: G06F17/50 ;  H01L21/027
Hybrid method for performing full field optical proximity correction for finfet mandrel layer
Abstract:
A hybrid OPC process and a resulting reticle are disclosed. Embodiments include generating a finfet fin reticle including a first portion having regular pitches and a second portion having irregular pitches, performing rule based OPC on at least the first portion, and performing OPC repair locally at the second portion.
Abstract(Chinese):

公开了一种混合OPC工艺和所得到的掩模版。 实施例包括生成包括具有规则间距的第一部分和具有不规则间距的第二部分的finfet鳍片标线，至少在第一部分执行基于规则的OPC，以及在第二部分处局部地执行OPC修复。

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