Invention Grant
- Patent Title: X-ray optical apparatus
- Patent Title (中): X射线光学装置
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Application No.: US13778780Application Date: 2013-02-27
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Publication No.: US09020102B2Publication Date: 2015-04-28
- Inventor: Mitsuaki Amemiya , Ichiro Nomura , Takeo Tsukamoto , Akira Miyake
- Applicant: Canon Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2012-053167 20120309
- Main IPC: G21K1/06
- IPC: G21K1/06

Abstract:
The present invention provides an X-ray optical apparatus including an X-ray reflective structure in which at least three reflective substrates are arranged with an interval and an X-ray which is incident into a plurality of X-ray passages whose both sides are put between the reflective substrates is reflected from the reflective substrate at both sides of the X-ray passage to be parallelized and emitted from the X-ray passage. When an edge of the X-ray reflective structure is an inlet of the X-ray and the other edge is an outlet of the X-ray, a pitch of the reflective substrates at the outlet is larger than a pitch at the inlet. Therefore, it is possible to efficiently parallelize the incident X-ray to be emitted with a simple structure.
Public/Granted literature
- US20130235980A1 X-RAY OPTICAL APPARATUS Public/Granted day:2013-09-12
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