Invention Grant
US09023582B2 Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition
有权
光敏聚合物，包含光敏聚合物的抗蚀剂组合物和使用抗蚀剂组合物制备抗蚀剂图案的方法
- Patent Title: Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition
- Patent Title (中): 光敏聚合物，包含光敏聚合物的抗蚀剂组合物和使用抗蚀剂组合物制备抗蚀剂图案的方法
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Application No.: US13795268Application Date: 2013-03-12
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Publication No.: US09023582B2Publication Date: 2015-05-05
- Inventor: Sang-Jun Choi
- Applicant: Sang-Jun Choi
- Applicant Address: KR Yongin, Gyunggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin, Gyunggi-Do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2012-0131950 20121120
- Main IPC: G03F7/20
- IPC: G03F7/20 ; C08G63/66 ; G03F7/004 ; G03F7/039
Abstract:
A photosensitive polymer includes a repeating unit represented by Formula 1 and the photosensitive polymer has a weight average molecule weight of from about 3,000 to about 50,000:
Public/Granted literature
Information query
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