Invention Grant
- Patent Title: Method of manufacturing liquid ejection head
- Patent Title (中): 液体喷射头的制造方法
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Application No.: US14287611Application Date: 2014-05-27
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Publication No.: US09023593B2Publication Date: 2015-05-05
- Inventor: Makoto Watanabe , Yoshinori Tagawa , Hiroyuki Murayama , Toshiaki Kurosu , Masataka Nagai , Takanobu Manabe
- Applicant: Canon Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2013-121538 20130610
- Main IPC: B41J2/05
- IPC: B41J2/05 ; B29C59/00 ; G03F7/20 ; B41J2/16

Abstract:
Provided is a method of manufacturing a liquid ejection head, including: forming, on a substrate, a flow path mold pattern that becomes a mold of a liquid flow path; forming a negative photosensitive resin layer on the flow path mold pattern; subjecting the negative photosensitive resin layer to exposure processing with use of a reduction projection exposing apparatus and a mask pattern having an ejection orifice mask shape for forming ejection orifices; and subjecting the negative photosensitive resin layer obtained after the exposure processing to development processing to form the ejection orifices, in which the ejection orifices are formed by correcting, by the ejection orifice mask shape, an inclination of an ejection angle due to an off-axis telecentricity caused by the reduction projection exposing apparatus so as to be close to a direction perpendicular to a surface of the substrate.
Public/Granted literature
- US20140361458A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD Public/Granted day:2014-12-11
Information query
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