Invention Grant
US09023662B2 Efficiently injecting spin-polarized current into semiconductors by interfacing crystalline ferromagnetic oxides directly on the semiconductor material
有权
通过直接在半导体材料上直接结晶铁磁性氧化物,有效地将自旋极化电流注入到半导体中
- Patent Title: Efficiently injecting spin-polarized current into semiconductors by interfacing crystalline ferromagnetic oxides directly on the semiconductor material
- Patent Title (中): 通过直接在半导体材料上直接结晶铁磁性氧化物,有效地将自旋极化电流注入到半导体中
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Application No.: US13465185Application Date: 2012-05-07
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Publication No.: US09023662B2Publication Date: 2015-05-05
- Inventor: Alexander A. Demkov , Agham-Bayan S. Posadas
- Applicant: Alexander A. Demkov , Agham-Bayan S. Posadas
- Applicant Address: US TX Austin
- Assignee: Board of Regents, The University of Texas System
- Current Assignee: Board of Regents, The University of Texas System
- Current Assignee Address: US TX Austin
- Agency: Winstead, P.C.
- Agent Robert A. Voigt, Jr.
- Main IPC: H01L21/02
- IPC: H01L21/02 ; G11C11/16 ; H01L43/12

Abstract:
A spintronic device and a method for making said spintronic device. The spintronic device includes an epitaxial crystalline ferromagnetic oxide formed directly on the semiconductor material thereby allowing spin-polarized current to be efficiently injected from the ferromagnetic oxide into the semiconductor material. A host crystal lattice includes multiple sets of stacked oxide layers of material A and B of a perovskite structure with a formula of ABO3. After an oxide layer of B is grown, magnetic ions are introduced to intermix with the B material, which may replace some of the ions of the B material. The process of growing additional stacked oxide layers of material A and B and introducing further magnetic ions after the deposition of the oxide layer of B continues until enough magnetic ions are sufficiently close to one another that they align in the same direction thereby forming a ferromagnetic oxide on the semiconductor material.
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