Invention Grant
US09023961B2 Acrylic resin composition, method of manufacturing the same, and architectural material, fashion accessory, and optical material formed using the same
有权
丙烯酸树脂组合物及其制造方法，以及建筑材料，时尚配件和使用其制成的光学材料
- Patent Title: Acrylic resin composition, method of manufacturing the same, and architectural material, fashion accessory, and optical material formed using the same
- Patent Title (中): 丙烯酸树脂组合物及其制造方法，以及建筑材料，时尚配件和使用其制成的光学材料
-
Application No.: US13375210Application Date: 2010-08-19
-
Publication No.: US09023961B2Publication Date: 2015-05-05
- Inventor: Junpei Yamanaka , Akiko Toyotama , Fumio Uchida , Satoshi Kawanaka
- Applicant: Junpei Yamanaka , Akiko Toyotama , Fumio Uchida , Satoshi Kawanaka
- Applicant Address: JP Osaka-Shi, Osaka
- Assignee: Fuji Chemical Company, Limited
- Current Assignee: Fuji Chemical Company, Limited
- Current Assignee Address: JP Osaka-Shi, Osaka
- Agency: Volpe and Koenig, P.C.
- Priority: JP2009-193171 20090824
- International Application: PCT/JP2010/064019 WO 20100819
- International Announcement: WO2011/024709 WO 20110303
- Main IPC: C08F2/44
- IPC: C08F2/44 ; C08K3/36 ; C08F265/06 ; C08L33/12 ; C08F2/46 ; C08F2/48
Abstract:
The present invention provides an acrylic resin composition containing a polycrystal of colloidal particles of silicon oxide in an acrylic resin that is formed by curing an acrylic monomer liquid at room temperature and/or an acrylic oligomer liquid at room temperature, wherein a mean distance between the colloidal particles in the polycrystal is 140 to 330 nm. The size of the single crystal that constitutes the polycrystal can be controlled by adjusting the content of silicon oxide and/or the additive amount of impurities. An architectural material, a fashion accessory, and an optical material are provided that are formed by using the acrylic resin composition.
Public/Granted literature
Information query
