Invention Grant
- Patent Title: Array substrate and manufacturing method thereof, display device
- Patent Title (中): 阵列基板及其制造方法,显示装置
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Application No.: US14041151Application Date: 2013-09-30
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Publication No.: US09024288B2Publication Date: 2015-05-05
- Inventor: Tuo Sun
- Applicant: BOE Technology Group Co., Ltd.
- Applicant Address: CN Beijing
- Assignee: BOE Technology Group Co., Ltd.
- Current Assignee: BOE Technology Group Co., Ltd.
- Current Assignee Address: CN Beijing
- Priority: CN201210375092 20120929
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L47/00 ; H01L29/04 ; H01L29/10 ; H01L31/00 ; H01L27/14 ; H01L29/00 ; H01L29/15 ; H01L29/18 ; H01L33/00 ; H01L29/20 ; H01L27/146 ; H01L21/00 ; H01L21/82 ; H01L21/84 ; H01L21/3205 ; H01L21/4763 ; H01L21/77

Abstract:
Embodiments of the present invention provide an array substrate, a manufacturing method thereof and a display device. The manufacturing method of an array substrate, comprising: forming a gate electrode on a base substrate by a first patterning process, and then depositing a gate insulating layer on the base substrate on which the gate electrode is formed; forming source and drain electrodes on the base substrate obtained after the above step, by a second patterning process; forming an active layer formed of a graphene layer, and a protective layer disposed on the active layer, on the base substrate obtained after the above steps, by a third patterning process; and forming a planarizing layer on the base substrate, obtained after the above steps, by a fourth patterning process, in which the planarizing layer is provided with a through hole through which the source or drain electrode is exposed.
Public/Granted literature
- US20140091280A1 ARRAY SUBSTRATE AND MANUFACTURING METHOD THEREOF, DISPLAY DEVICE Public/Granted day:2014-04-03
Information query
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