Invention Grant
US09024311B2 Thin film transistor, method for manufacturing same, active matrix substrate, display panel and display device
有权
薄膜晶体管,制造方法,有源矩阵基板,显示面板和显示装置
- Patent Title: Thin film transistor, method for manufacturing same, active matrix substrate, display panel and display device
- Patent Title (中): 薄膜晶体管,制造方法,有源矩阵基板,显示面板和显示装置
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Application No.: US13379670Application Date: 2010-04-06
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Publication No.: US09024311B2Publication Date: 2015-05-05
- Inventor: Takeshi Hara , Hirohiko Nishiki , Yoshimasa Chikama , Kazuo Nakagawa , Yoshifumi Ohta , Tetsuya Aita , Masahiko Suzuki , Okifumi Nakagawa , Yoshiyuki Miyajima , Yuuji Mizuno , Michiko Takei , Yoshiyuki Harumoto
- Applicant: Takeshi Hara , Hirohiko Nishiki , Yoshimasa Chikama , Kazuo Nakagawa , Yoshifumi Ohta , Tetsuya Aita , Masahiko Suzuki , Okifumi Nakagawa , Yoshiyuki Miyajima , Michiko Takei , Yoshiyuki Harumoto , Hinae Mizuno
- Applicant Address: JP Osaka
- Assignee: Sharp Kabushiki Kaisha
- Current Assignee: Sharp Kabushiki Kaisha
- Current Assignee Address: JP Osaka
- Agency: Keating & Bennett, LLP
- Priority: JP2009-149470 20090624; JP2009-235737 20091009
- International Application: PCT/JP2010/002520 WO 20100406
- International Announcement: WO2010/150446 WO 20101229
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L21/336 ; H01L27/12

Abstract:
The present invention provides a thin film transistor including an oxide semiconductor layer (4) for electrically connecting a signal electrode (6a) and a drain electrode (7a), the an oxide semiconductor layer being made from an oxide semiconductor; and a barrier layer (6b) made from at least one selected from the group consisting of Ti, Mo, W, Nb, Ta, Cr, nitrides thereof, and alloys thereof, the barrier layer (6b) being in touch with the signal electrode (6a) and the oxide semiconductor layer (4) and separating the signal electrode (6a) from the oxide semiconductor layer (4). Because of this configuration, the thin film transistor can form and maintain an ohmic contact between the first electrode and the channel layer, thereby being a thin film transistor with good properties.
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