Invention Grant
- Patent Title: Compound semiconductor device with buried field plate
- Patent Title (中): 具有埋弧场的复合半导体器件
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Application No.: US13331970Application Date: 2011-12-20
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Publication No.: US09024356B2Publication Date: 2015-05-05
- Inventor: Gilberto Curatola , Oliver Häberlen
- Applicant: Gilberto Curatola , Oliver Häberlen
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/40 ; H01L29/423

Abstract:
A semiconductor device includes a first compound semiconductor material and a second compound semiconductor material on the first compound semiconductor material. The second compound semiconductor material comprises a different material than the first compound semiconductor material such that the first compound semiconductor material has a two-dimensional electron gas (2DEG). The semiconductor device further includes a buried field plate disposed in the first compound semiconductor material and electrically connected to a terminal of the semiconductor device. The 2DEG is interposed between the buried field plate and the second compound semiconductor material.
Public/Granted literature
- US20130153967A1 Compound Semiconductor Device with Buried Field Plate Public/Granted day:2013-06-20
Information query
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