Invention Grant
- Patent Title: Solid-state imaging device and method of manufacturing solid-state imaging device
- Patent Title (中): 固态成像装置及制造固态成像装置的方法
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Application No.: US12838517Application Date: 2010-07-19
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Publication No.: US09024361B2Publication Date: 2015-05-05
- Inventor: Hiroyuki Ohri , Yasunori Sogoh
- Applicant: Hiroyuki Ohri , Yasunori Sogoh
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Dentons US LLP
- Priority: JP2009-174329 20090727; JP2010-065114 20100319
- Main IPC: H01L27/148
- IPC: H01L27/148 ; H01L21/00 ; H01L27/146

Abstract:
Provided is a solid-state imaging device including: a photodiode which converts an optical signal to signal charges; a transfer gate which transfers the signal charges from the photodiode; an impurity diffusion layer to which the signal charges are transferred by the transfer gate; and a MOS transistor of which a gate is connected to the impurity diffusion layer. The impurity diffusion layer has a first conduction type semiconductor layer and a second conduction type semiconductor layer which is formed in the first conduction type semiconductor layer and under an end portion of the transfer gate.
Public/Granted literature
- US20110018037A1 SOLID-STATE IMAGING DEVICE AND METHOD OF MANUFACTURING SOLID-STATE IMAGING DEVICE Public/Granted day:2011-01-27
Information query
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