Invention Grant
- Patent Title: Field-effect P-N junction
- Patent Title (中): 场效应P-N结
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Application No.: US13773985Application Date: 2013-02-22
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Publication No.: US09024367B2Publication Date: 2015-05-05
- Inventor: William Regan , Alexander Zettl
- Applicant: The Regents of the University of California
- Applicant Address: US CA Oakland
- Assignee: The Regents of the University of California
- Current Assignee: The Regents of the University of California
- Current Assignee Address: US CA Oakland
- Agency: Lawrence Berkeley National Laboratory
- Main IPC: H01L29/68
- IPC: H01L29/68 ; H01L31/07 ; H01L29/66 ; H01L31/06

Abstract:
This disclosure provides systems, methods, and apparatus related to field-effect p-n junctions. In one aspect, a device includes an ohmic contact, a semiconductor layer disposed on the ohmic contact, at least one rectifying contact disposed on the semiconductor layer, a gate including a layer disposed on the at least one rectifying contact and the semiconductor layer and a gate contact disposed on the layer. A lateral width of the rectifying contact is less than a semiconductor depletion width of the semiconductor layer. The gate contact is electrically connected to the ohmic contact to create a self-gating feedback loop that is configured to maintain a gate electric field of the gate.
Public/Granted literature
- US20130221415A1 Field-Effect P-N Junction Public/Granted day:2013-08-29
Information query
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