Invention Grant
US09024383B2 Semiconductor device with a super junction structure with one, two or more pairs of compensation layers
有权
具有超结结构的半导体器件,具有一对,两对或更多对补偿层
- Patent Title: Semiconductor device with a super junction structure with one, two or more pairs of compensation layers
- Patent Title (中): 具有超结结构的半导体器件,具有一对,两对或更多对补偿层
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Application No.: US13874840Application Date: 2013-05-01
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Publication No.: US09024383B2Publication Date: 2015-05-05
- Inventor: Stefan Gamerith , Armin Willmeroth , Franz Hirler
- Applicant: Infineon Technologies Austria AG
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/06 ; H01L29/78 ; H01L27/148

Abstract:
A super junction semiconductor device comprises a semiconductor portion with mesa regions protruding from a base section. The mesa regions are spatially separated in a lateral direction parallel to a first surface of the semiconductor portion. A compensation structure with at least two first compensation layers of a first conductivity type and at least two second compensation layers of a complementary second conductivity type may cover sidewalls of the mesa regions and portions of the base section between the mesa regions. Buried lateral faces of segments of the compensation structure may cut the first and second compensation layers between the mesa regions. A drain connection structure of the first conductivity type may extend along the buried lateral faces and may structurally connect the first compensation layers in an economic way keeping the thermal budget low.
Public/Granted literature
- US20140327068A1 Semiconductor Device with a Super Junction Structure with One, Two or More Pairs of Compensation Layers Public/Granted day:2014-11-06
Information query
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