Invention Grant
- Patent Title: Double side wafer process, method and device
- Patent Title (中): 双面晶圆工艺,方法和装置
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Application No.: US12981383Application Date: 2010-12-29
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Publication No.: US09024408B2Publication Date: 2015-05-05
- Inventor: Ming Fang
- Applicant: Ming Fang
- Applicant Address: US TX Coppell
- Assignee: STMicroelectronics, Inc.
- Current Assignee: STMicroelectronics, Inc.
- Current Assignee Address: US TX Coppell
- Agency: Seed IP Law Group PLLC
- Main IPC: H01L27/24
- IPC: H01L27/24 ; B41J2/16 ; B81C1/00 ; G01P15/00

Abstract:
A method of manufacturing double-sided semiconductor die by performing a first plurality of processes to a first side of a wafer and performing a second plurality of processes to a second side of the wafer, thereby forming at least a first semiconductor device on the first side of the wafer and at least a second semiconductor device on the second side of the wafer. The wafer may be cut to form a plurality of die having at least one semiconductor device on each side.
Public/Granted literature
- US20120168896A1 DOUBLE SIDE WAFER PROCESS, METHOD AND DEVICE Public/Granted day:2012-07-05
Information query
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