Invention Grant
- Patent Title: Exposure apparatus adjusting method, exposure apparatus, and device fabricating method
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Application No.: US12219755Application Date: 2008-07-28
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Publication No.: US09025126B2Publication Date: 2015-05-05
- Inventor: Yosuke Shirata , Yoshiki Kida
- Applicant: Yosuke Shirata , Yoshiki Kida
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2007-198675 20070731
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
An adjusting method that adjusts an immersion exposure apparatus that comprises a first holder, which holds a substrate, and a second holder, which holds the substrate before the substrate is held by the first holder, and that exposes the substrate, which is held by the first holder, through a liquid. The adjusting method comprises: holding a thermometer with the first holder; holding the thermometer with the second holder; and adjusting the temperature of at least one of the first holder and the second holder based on the detection result of the thermometer held by the first holder and the detection result of the thermometer held by the second holder.
Public/Granted literature
- US20090279059A1 Exposure apparatus adjusting method, exposure apparatus, and device fabricating method Public/Granted day:2009-11-12
Information query
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