Invention Grant
- Patent Title: Digital exposure apparatus and method of exposing a substrate using the same
- Patent Title (中): 数字曝光装置及使用其的曝光基板的方法
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Application No.: US13406828Application Date: 2012-02-28
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Publication No.: US09025132B2Publication Date: 2015-05-05
- Inventor: Sang-Hyun Yun , Cha-Dong Kim , Jung-In Park , Su-Yeon Sim , Hi-Kuk Lee
- Applicant: Sang-Hyun Yun , Cha-Dong Kim , Jung-In Park , Su-Yeon Sim , Hi-Kuk Lee
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2011-0068680 20110712
- Main IPC: G03B27/54
- IPC: G03B27/54 ; G03B27/42 ; G03F7/20

Abstract:
A digital exposure apparatus includes a displaceable stage, a light source part, a digital micro mirror part and a micro lens part. A substrate is disposed on the stage. The light source part generates a first light. The digital micro mirror part is disposed over the stage. The digital micro mirror part includes a plurality of digital micro mirrors. The digital micro mirror converts the first light into one or more second light beams. The micro lens part is disposed between the stage and the digital micro mirror part and includes a plurality of micro lenses. The micro lenses convert the one or more second light beams into one or more third light beams which are irradiated upon the substrate. The third light has an oval cross sectional shape.
Public/Granted literature
- US20130016330A1 DIGITAL EXPOSURE APPARATUS AND METHOD OF EXPOSING A SUBSTRATE USING THE SAME Public/Granted day:2013-01-17
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