In a laser interference lithography apparatus, a laser source provides a first laser beam, and an optics assembly is optically coupled to the laser source and receives and processes the first laser beam into one or multiple second laser beams. An exposure stage carries a to-be-exposed object. The fiber assembly receives and processes the second laser beam(s) into one or multiple single mode and stable coherent third laser beams without spatial noise. An interference pattern is generated on the to-be-exposed object using the third laser beam(s). The apparatus is configured without a pin hole spatial filter and a beam expander being disposed on an optical path from an output end of the laser source to the exposure stage.