Invention Grant
US09025135B2 Shared compliance in a rapid exchange device for reticles, and reticle stage
有权
在标线的快速交换装置和标线片阶段共享合规性
- Patent Title: Shared compliance in a rapid exchange device for reticles, and reticle stage
- Patent Title (中): 在标线的快速交换装置和标线片阶段共享合规性
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Application No.: US13260017Application Date: 2010-02-24
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Publication No.: US09025135B2Publication Date: 2015-05-05
- Inventor: Richard John Johnson , Frits Van Der Meulen , Eric Bernard Westphal , Jeremy Rex Heaston
- Applicant: Richard John Johnson , Frits Van Der Meulen , Eric Bernard Westphal , Jeremy Rex Heaston
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee: ASML Holding N.V.,ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- International Application: PCT/EP2010/052340 WO 20100224
- International Announcement: WO2010/115657 WO 20101014
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/677 ; H01L21/67
Abstract:
Provided is a method to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, a Rapid Exchange Device (RED) configured to load a patterning device (1010) onto a reticle stage (RS) of a lithography system, and a system for manufacturing a semiconductor device lithographically. The method involves sharing compliance among six degree of freedom between the reticle stage (RS) and the RED. The RED complies in only a first three degrees of freedom and the reticle stage (RS) in only a second three degrees of freedom until the reticle stage (RS) and patterning device (1010) are substantially in contact and coplanar.
Public/Granted literature
- US20120092640A1 Shared Compliance in a Rapid Exchange Device for Reticles, and Reticle Stage Public/Granted day:2012-04-19
Information query
IPC分类:
