Invention Grant
- Patent Title: Method of structuring a photosensitive material
- Patent Title (中): 构成感光材料的方法
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Application No.: US13718224Application Date: 2012-12-18
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Publication No.: US09025137B2Publication Date: 2015-05-05
- Inventor: Aksel Goehnermeier
- Applicant: Carl Zeiss SMT GmbH
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Fish & Richardson P.C.
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03F7/20 ; G03F1/00

Abstract:
A method of structuring a photosensitive material is disclosed. The method includes illuminating a first object structure and projecting a pattern of the first object structure onto a photosensitive material such that the projected pattern of the first object structure is focussed at a first focus position with respect to the photosensitive material. The method also includes illuminating a second object structure and projecting a pattern of the second object structure onto the photosensitive material such that the projected pattern of the second object structure is focussed at a second focus position with respect to the photosensitive material. The respective patterns are projected in the same projection direction.
Public/Granted literature
- US20130120726A1 METHOD OF STRUCTURING A PHOTOSENSITIVE MATERIAL Public/Granted day:2013-05-16
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