Invention Grant
- Patent Title: Information processing apparatus, parameter setting method, and program
- Patent Title (中): 信息处理装置,参数设定方法和程序
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Application No.: US13170571Application Date: 2011-06-28
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Publication No.: US09026933B2Publication Date: 2015-05-05
- Inventor: Ritsuko Kano , Yoshihito Ohki , Akihiro Komori , Reiko Miyazaki
- Applicant: Ritsuko Kano , Yoshihito Ohki , Akihiro Komori , Reiko Miyazaki
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-192249 20100830
- Main IPC: G06F3/048
- IPC: G06F3/048 ; G06F3/0488 ; G06F3/0484

Abstract:
There is provided an information processing apparatus including a position detection unit for detecting a contact position of an operating tool which has contacted a screen, an area size detection unit for detecting a contact area size of the operating tool which has contacted the screen, a pressure detection unit for detecting a pressure of the operating tool pressing the screen, and a parameter setting unit for setting, according to the contact area size of the operating tool on an object for parameter setting displayed on the screen and the pressure of the operating tool pressing the object, a size of a parameter associated with the object.
Public/Granted literature
- US20120054665A1 INFORMATION PROCESSING APPARATUS, PARAMETER SETTING METHOD, AND PROGRAM Public/Granted day:2012-03-01
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