Invention Grant
- Patent Title: Self-regulating pressure source
- Patent Title (中): 自调压源
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Application No.: US13420886Application Date: 2012-03-15
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Publication No.: US09027336B2Publication Date: 2015-05-12
- Inventor: Cagdas Denizel Onal , Daniela Rus , Xin Chen , George M. Whitesides
- Applicant: Cagdas Denizel Onal , Daniela Rus , Xin Chen , George M. Whitesides
- Applicant Address: US MA Cambridge US MA Cambridge
- Assignee: Massachusetts Institute of Technology,President and Fellows of Harvard College
- Current Assignee: Massachusetts Institute of Technology,President and Fellows of Harvard College
- Current Assignee Address: US MA Cambridge US MA Cambridge
- Agency: MIT Technology Licensing Office
- Agent Sam Pasternack
- Main IPC: F16D31/02
- IPC: F16D31/02 ; G05D16/06 ; F15B21/06

Abstract:
Self-regulating pressure source. The pressure source includes a chamber enclosing a chemical monopropellant. A moveable boss is attached to a deformable membrane sealing an air chamber, the moveable boss and air chamber being disposed within the chamber. A catalyst is disposed around the membrane so as to be covered by the boss in a retracted position so that the monopropellant is broken down by the catalyst to produce a gas. The gas pressure will increase within the chamber causing air in the air chamber to compress thereby to pull the boss into the retracted position to cover the catalyst thereby to regulate the pressure within the chamber. The self-regulating pressure source is particularly suited to power fluidic elastomeric actuators.
Public/Granted literature
- US20120272642A1 SELF-REGULATING PRESSURE SOURCE Public/Granted day:2012-11-01
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