Invention Grant
- Patent Title: Hemostatic materials and devices with galvanic particulates
- Patent Title (中): 止血材料和具有电偶颗粒的装置
-
Application No.: US13333136Application Date: 2011-12-21
-
Publication No.: US09028851B2Publication Date: 2015-05-12
- Inventor: Yi-Lan Wang , Ying Sun , Guanghui Zhang , Chunlin Yang
- Applicant: Yi-Lan Wang , Ying Sun , Guanghui Zhang , Chunlin Yang
- Applicant Address: US NJ Somerville
- Assignee: Ethicon, Inc.
- Current Assignee: Ethicon, Inc.
- Current Assignee Address: US NJ Somerville
- Agent David R. Crichton
- Main IPC: A61K9/70
- IPC: A61K9/70 ; A61P7/04 ; A61K9/00 ; A61K33/00 ; A61K33/34 ; A61L24/00 ; A61L24/02 ; A61L24/08 ; A61K33/30
Abstract:
The present invention is directed to a hemostatic material comprising a scaffold and a galvanic particulate. The galvanic particulate comprises particles made of at least two dissimilar metals. The scaffold is preferably a biocompatible polysaccharide-based hemostatic, such as a chitosan or cellulosic based hemostatic like ORC.
Public/Granted literature
- US20130164360A1 Hemostatic Materials and Devices with Galvanic Particulates Public/Granted day:2013-06-27
Information query
