Invention Grant
US09029049B2 Method for processing a carrier, a carrier, an electronic device and a lithographic mask
有权
用于处理载体，载体，电子装置和光刻掩模的方法
- Patent Title: Method for processing a carrier, a carrier, an electronic device and a lithographic mask
- Patent Title (中): 用于处理载体，载体，电子装置和光刻掩模的方法
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Application No.: US13771129Application Date: 2013-02-20
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Publication No.: US09029049B2Publication Date: 2015-05-12
- Inventor: Jens Schneider , Henning Feick , Marcel Heller , Dieter Kaiser
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Main IPC: H01L21/266
- IPC: H01L21/266 ; G03F1/00 ; G03F7/20 ; H01L29/36 ; G01L1/22 ; H01L21/027 ; H01L21/265 ; H01L43/06 ; H01L43/14 ; H01L29/78 ; H01L29/08 ; H01L27/02 ; H01L29/861
Abstract:
Various embodiments provide a method for processing a carrier, the method including changing the three-dimensional structure of a mask layer arranged over the carrier so that at least two mask layer regions are formed having different mask layer thicknesses; and applying an ion implantation process to the at least two mask layer regions to form at least two implanted regions in the carrier having different implantation depth profiles.
Public/Granted literature
- US20140231970A1 METHOD FOR PROCESSING A CARRIER, A CARRIER, AN ELECTRONIC DEVICE AND A LITHOGRAPHIC MASK Public/Granted day:2014-08-21
Information query
IPC分类:
