Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US12888825Application Date: 2010-09-23
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Publication No.: US09029191B2Publication Date: 2015-05-12
- Inventor: Shunpei Yamazaki , Takahiro Tsuji , Kunihiko Suzuki
- Applicant: Shunpei Yamazaki , Takahiro Tsuji , Kunihiko Suzuki
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2009-218904 20090924
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L29/786 ; H01L29/66 ; H01L27/12

Abstract:
An object is to provide a high reliability thin film transistor using an oxide semiconductor layer which has stable electric characteristics. In the thin film transistor in which an oxide semiconductor layer is used, the amount of change in threshold voltage of the thin film transistor before and after a BT test is made to be 2 V or less, preferably 1.5 V or less, more preferably 1 V or less, whereby the semiconductor device which has high reliability and stable electric characteristics can be manufactured. In particular, in a display device which is one embodiment of the semiconductor device, a malfunction such as display unevenness due to change in threshold voltage can be reduced.
Public/Granted literature
- US20110068388A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2011-03-24
Information query
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