Invention Grant
- Patent Title: Filter for material supply apparatus of an extreme ultraviolet light source
- Patent Title (中): 过滤器用于极紫外光源的材料供应装置
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Application No.: US13112784Application Date: 2011-05-20
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Publication No.: US09029813B2Publication Date: 2015-05-12
- Inventor: Igor V. Fomenkov , William N. Partlo , Georgiy O. Vaschenko , William Oldham
- Applicant: Igor V. Fomenkov , William N. Partlo , Georgiy O. Vaschenko , William Oldham
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: DiBerardino McGovern IP Group LLC
- Main IPC: G01J3/10
- IPC: G01J3/10 ; B22F3/105 ; B01D29/56

Abstract:
A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.
Public/Granted literature
- US20120292527A1 Filter for Material Supply Apparatus Public/Granted day:2012-11-22
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