Invention Grant
- Patent Title: Semiconductor memory device and manufacturing method thereof
- Patent Title (中): 半导体存储器件及其制造方法
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Application No.: US14263269Application Date: 2014-04-28
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Publication No.: US09029929B2Publication Date: 2015-05-12
- Inventor: Toshihiko Saito
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Fish & Richardson P.C.
- Priority: JP2011-112102 20110519
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L21/8242 ; H01L29/786 ; H01L21/84 ; H01L27/115 ; H01L27/12 ; H01L21/02 ; G11C11/404

Abstract:
A memory cell therein includes a first transistor and a capacitor and stores data corresponding to a potential held in the capacitor. The first transistor includes a pair of electrodes, an insulating film in contact with side surfaces of the electrodes, a first gate electrode provided between the electrodes with the insulating film provided between the first gate electrode and each electrode and whose top surface is at a lower level than top surfaces of the electrodes, a first gate insulating film over the first gate electrode, an oxide semiconductor film in contact with the first gate insulating film and the electrodes, a second gate insulating film at least over the oxide semiconductor film, and a second gate electrode over the oxide semiconductor film with the second gate insulating film provided therebetween. The capacitor is connected to the first transistor through one of the electrodes.
Public/Granted literature
- US20140231801A1 Semiconductor Memory Device And Manufacturing Method Thereof Public/Granted day:2014-08-21
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