Invention Grant
- Patent Title: Vertical tunneling field-effect transistor cell
- Patent Title (中): 垂直隧道场效应晶体管单元
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Application No.: US13773462Application Date: 2013-02-21
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Publication No.: US09029940B2Publication Date: 2015-05-12
- Inventor: Harry-Hak-Lay Chuang , Cheng-Cheng Kuo , Ming Zhu
- Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/78

Abstract:
A tunneling field-effect transistor (TFET) device is disclosed. The TFET device includes a source contact on the source region, a plurality of gate contacts at a planar portion of a gate stack and a plurality of drain contacts disposed on a drain region. The source contact of the TFET device aligns with other two adjacent source contacts of other two TFET devices such that each source contact locates in one of three angles of an equilateral triangle.
Public/Granted literature
- US20140231902A1 Vertical Tunneling Field-Effect Transistor Cell Public/Granted day:2014-08-21
Information query
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