Invention Grant
- Patent Title: Vertical transistor component
- Patent Title (中): 垂直晶体管元件
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Application No.: US13949968Application Date: 2013-07-24
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Publication No.: US09029941B2Publication Date: 2015-05-12
- Inventor: Andreas Meiser , Markus Zundel , Christoph Kadow
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Murphy, Bilak & Homiller, PLLC
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/78 ; H01L29/06 ; H01L29/423 ; H01L29/739 ; H01L21/8234 ; H01L27/088 ; H01L29/40 ; H01L29/417

Abstract:
A vertical transistor component includes a semiconductor body with first and second surfaces, a drift region, and a source region and body region arranged between the drift region and the first surface. The body region is also arranged between the source region and the drift region. The vertical transistor component further includes a gate electrode arranged adjacent to the body zone, a gate dielectric arranged between the gate electrode and the body region, and a drain region arranged between the drift region and the second surface. A source electrode electrically contacts the source region, is electrically insulated from the gate electrode and arranged on the first surface. A drain electrode electrically contacts the drain region and is arranged on the second surface. A gate contact electrode is electrically insulated from the semiconductor body, extends in the semiconductor body to the second surface, and is electrically connected with the gate electrode.
Public/Granted literature
- US20130307062A1 Vertical Transistor Component Public/Granted day:2013-11-21
Information query
IPC分类: