Invention Grant
- Patent Title: Power transistor device with super junction
- Patent Title (中): 功率晶体管器件超级结
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Application No.: US14221258Application Date: 2014-03-20
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Publication No.: US09029942B2Publication Date: 2015-05-12
- Inventor: Yung-Fa Lin , Shou-Yi Hsu , Meng-Wei Wu , Chia-Hao Chang
- Applicant: Anpec Electronics Corporation
- Applicant Address: TW Hsinchu Science Park, Hsin-Chu
- Assignee: Anpec Electronics Corporation
- Current Assignee: Anpec Electronics Corporation
- Current Assignee Address: TW Hsinchu Science Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Priority: TW100143697A 20111129
- Main IPC: H01L29/72
- IPC: H01L29/72 ; H01L29/78 ; H01L29/10 ; H01L29/66 ; H01L29/06

Abstract:
The present invention provides a power transistor device with a super junction including a substrate, a first epitaxial layer, a second epitaxial layer, and a third epitaxial layer. The first epitaxial layer is disposed on the substrate, and has a plurality of trenches. The trenches are filled up with the second epitaxial layer, and a top surface of the second epitaxial layer is higher than a top surface of the first epitaxial layer. The second epitaxial layer has a plurality of through holes penetrating through the second epitaxial layer and disposed on the first epitaxial layer. The second epitaxial layer and the first epitaxial layer have different conductivity types. The through holes are filled up with the third epitaxial layer, and the third epitaxial layer is in contact with the first epitaxial layer. The third epitaxial layer and the first epitaxial layer have the same conductivity type.
Public/Granted literature
- US20140197478A1 POWER TRANSISTOR DEVICE WITH SUPER JUNCTION AND MANUFACTURING METHOD THEREOF Public/Granted day:2014-07-17
Information query
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