Invention Grant
- Patent Title: Field device and method of operating high voltage semiconductor device applied with the same
- Patent Title (中): 运行高压半导体器件的现场设备和方法
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Application No.: US14519192Application Date: 2014-10-21
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Publication No.: US09029947B2Publication Date: 2015-05-12
- Inventor: An-Li Cheng , Miao-Chun Chung , Chih-Chia Hsu , Yin-Fu Huang
- Applicant: Macronix International Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Macronix International Co., Ltd.
- Current Assignee: Macronix International Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L21/02 ; H01L21/336 ; H03K17/16 ; H01L29/40 ; H01L29/78 ; H03K17/56 ; H01L29/06 ; H01L29/10

Abstract:
A field device and method of operating high voltage semiconductor device applied with the same are provided. The field device includes a first well having a second conductive type and second well having a first conductive type both formed in the substrate (having the first conductive type) and extending down from a surface of the substrate, the second well adjacent to one side of the first well and the substrate is at the other side of the first well; a first doping region having the first conductive type and formed in the second well, the first doping region spaced apart from the first well; a conductive line electrically connected to the first doping region and across the first well region; and a conductive body insulatively positioned between the conductive line and the first well, and the conductive body correspondingly across the first well region.
Public/Granted literature
- US20150035583A1 FIELD DEVICE AND METHOD OF OPERATING HIGH VOLTAGE SEMICONDUCTOR DEVICE APPLIED WITH THE SAME Public/Granted day:2015-02-05
Information query
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